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K-Cellシリーズ

Si用高温Kセル
High-Temperature K Cell for Si 

Capable of high-precision control of film thickness, which was not previously achieved by an EB gun.

窒素用ラジカルセル
Nitrogen Radical Cell 

Ions can be removed by the ion removal mechanism (magnetic field system) provided at the top of the cell.

デュアルセル
Dual Cell 

A single cell port allows for use of two kinds of materials.

特殊横型Kセル
Special Horizontal K Cell 

Suitable for placing the evaporation source horizontally.

スーパーミニセル
Super Mini Cell 

Ultra-small K cell suitable for use with analysis systems.

コンビネーションセル
Combination Cell 

Evaporation source with a single port for providing a solid material and gas material.

光加熱セル
Light Heating Cell 

Uses a rapid temperature rise/fall system to evaporate and sublimate the material and generates molecular beams.

ガスセル
Gas Cell 

Generate molecular beams from loaded various gas materials.

スポットビームセル
Spot Beam Cell 

Suitable for using a particular material beam.

2000度対応高温セル
2000℃ compatible cell 

Optimum high-temperature K cell as an evaporation source for high melting point metals. Can be heated up to 2000℃.

変換シャッター
Convert Shutter 

When ICF114 is used as a system mounting port, a shutter mechanism can be added to the K cell with a size of ICF70 (without               shutter).