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Liquid Delivery MOCVD System

For research purpose of small machines (MPC1100V)

¬Œ^Œ¤‹†—p (MPC1100V)

Specification

  • Reactor
  • Substrate size
  • Substrate heating
  • Max. heating temperature
  • Flow control
  • Vaporization system
  • Application
  • Horizontal quartz
  • ƒ³1-inch x 1
  • Lamp heating system

  • 800 Ž (thermocouple value for control)
  • Liquid mass flow controller
  • Thermal vaporizer

  • Oxide etc.

For research (MPC2100H)

Œ¤‹†—p (MPC2100H)

Specification

  • Reactor
  • Load-lock system
  • Substrate size
  • Substrate heating
  • Max. heating temperature
  • Flow control
  • Vaporization system
  • Application
  • Vertical stainless steel
  • With transfer rod

  • ƒ³2-inch x 1
  • Resistance heating system

  • 800Ž(thermocouple value for control)
  • Liquid mass flow controller
  • Thermal vaporizer

  • Oxide etc.

For research & quasi-production (MPC6100)

Œ¤‹†—pE€¶ŽY—p (MPC6100)

Specification

  • Reactor
  • Load-lock system
  • Substrate size
  • Substrate heating
  • Max. heating temperature
  • Flow control
  • Vaporization system
  • Application
  • Vertical stainless steel
  • With transfer rod

  • ƒ³6-inch x 1
  • Resistance heating system

  • 800Ž(thermocouple value for control)
  • Liquid mass flow controller
  • Thermal vaporizer

  • Oxide, such as PZT, etc.
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