Liquid Delivery MOCVD System
For research purpose of small machines (MPC1100V)
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Specification
- Reactor
- Substrate size
- Substrate heating
- Max. heating temperature
- Flow control
- Vaporization system
- Application
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- Horizontal quartz
- Φ1-inch x 1
- Lamp heating system
- 800 ℃ (thermocouple value for control)
- Liquid mass flow controller
- Thermal vaporizer
- Oxide etc.
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For research (MPC2100H)
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Specification
- Reactor
- Load-lock system
- Substrate size
- Substrate heating
- Max. heating temperature
- Flow control
- Vaporization system
- Application
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- Vertical stainless steel
- With transfer rod
- Φ2-inch x 1
- Resistance heating system
- 800℃(thermocouple value for control)
- Liquid mass flow controller
- Thermal vaporizer
- Oxide etc.
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For research & quasi-production (MPC6100)
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Specification
- Reactor
- Load-lock system
- Substrate size
- Substrate heating
- Max. heating temperature
- Flow control
- Vaporization system
- Application
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- Vertical stainless steel
- With transfer rod
- Φ6-inch x 1
- Resistance heating system
- 800℃(thermocouple value for control)
- Liquid mass flow controller
- Thermal vaporizer
- Oxide, such as PZT, etc.
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