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MOCVD System

Heating System

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In order to manufacture high-performance films with good uniformity, it is necessary to have a heating mechanism with superior uniformity of temperature inside the substrate.

Features

  • One can select susceptor shape arbitrarily in accordance with a gas flow pattern.
  • Simplified arrangement around the reactor allows easy maintenance of reactor.
  • Maintenance-free heater
  • Easy and low-cost compatibility with mass production devices
  • Adoption of metal reactors may improve safety